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Swarm Intelligence-Inspired Spontaneous Fabrication of Optimal Interconnect at the Micro/Nanoscale

   A spontaneous process is demonstrated to assemble nanoparticles into optimal interconnect, as natural systems spontaneously figuring out the shortest path. The optimal interconnect leads to a 65.9% decrease in electromagnetic interference, a 17.1% decrease in delay, and a 24.5% decrease in energy-delay. It will be of great significance for interconnect fabrication of versatile electronic circuits.  ( Paper: Meng Su, Zhandong Huang, Yong Huang, Shuoran Chen, Xin Qian, Wenbo Li, Yifan Li, Weihua Pei, Hongda Chen, Fengyu Li,* and Yanlin Song*, Adv. Mater. 2016, DOI: 10.1002/adma.201605223.)